Reflection spectrophotometric meter for laboratory to in-line inspection, measuring up to 9 transparent films simultaneously.
The compact film thickness monitor is a reflection spectrophotometric film thickness meter that uses a small reflection probe and is applied in all situations from the laboratory level to in-line 100% inspection in the production process. It has excellent maintainability and can be used for incorporation into process equipment and line management. Simultaneous measurement of up to 9 types of transparent films is possible. It can be used as an in-line or end-point monitor for the various multi-layered film processes. The compact probe can be installed in a small space inside the process tool. It is also possible to judge the mixture ratio of the mixed layer or the crystallinity of Polysilicon by using the EMA theory.1.Compact probe with the optical fiber
6. Wireless (option) 7. Film thickness endpoint detection software is included (video below) 8. Automatic mapping stage (option)
can be installed in a small space inside the process tool. Since the 30 mm probe is connected with an optical fiber, it has good durability.
2. Good repeatability of the film thickness measurement 0.1nm(3σ) 3. Multilayer film thickness measurement up to 9 Layers 4. Material analysis function・ Evaluation of mixing ratio of the composite material using EMA ・Crystallinity and Analysis of the optical constants
5. Selectable light source| Light Source | Wavelength range (mm) | Target thickness area (nm) | Typical lifetime (hour) |
| White color LED | 430~700 | 50~50,000 | > 50,000 |
| Tungsten-Halogen | 400~900 | 50~50,000 | 10,000 |
| Deuterium-Halogen | 220~900 | 10~30,000 | 1,000 |
Configuration
Example of Spectrum and short-term repeatability
Sheet thickness monitor Infrared Sheet Thickness Monitors: Ideal for measuring translucent sheets and low reflective coatings in lab and production settings, with multi-parameter analysis. 
Automatic wafer Mapping Device Reliable film thickness mapping for up to 300 mm wafers, ideal for semiconductor manufacturing with self-calibration and cleanliness.
